The principle, advantages and disadvantages of the source of electron beam evaporation

The principle, advantages and disadvantages of the source of electron beam evaporation

The source of resistance heating evaporation can not meet the needs of evaporation of some high melting point metals and oxides, especially for the preparation of high-purity films. Electron beam heating evaporation method has overcome many shortcomings of resistance heating evaporation and has been widely used.

Electron beam heating principle:

The focused electron beam can locally heat the element source and avoid pollution because it does not heat other parts;

High energy electron beam can make high melting point elements reach enough high temperature to produce proper vapor pressure.

Advantages of electron beam evaporation source:

1. The beam density of electron beam is high, which can obtain much higher energy density than resistance heating source.
2. The evaporated material is placed in a water-cooled crucible, which avoids the evaporation of the container material and the reaction between the container material and the evaporated material, and improves the purity of the film.
3. The heat is directly added to the surface of the material, which has high thermal efficiency and small heat conduction and radiation loss.

Disadvantages of electron beam evaporation source:

1. It can ionize the evaporated gas and residual gas, and sometimes affect the quality of the film;
2. The structure of electron beam evaporation device is complex and expensive;
3. The soft X-ray produced has certain harm to human body.

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