上传

WELCOME TO Taizhou ATS Optical Materials Co., Ltd

ats-sales@dmcl.cn

  • Home
  • Products
      • Hot Sale products
      • Main Products
      • ZnS
      • Ti3O5
      • SiO2
      • ZrO2
      • SiO
      • ZnSe
      • MgF2
      • Al2O3
      • Ta2O5
      • TiO2
      • TiO
      • Ti2O3
      • Nb2O5
      • ITO
      • LaTiO3
      • Sputtering Targets & Metal
      • Vacuum accessories
      • *
      • Ungrouped
  • News
  • About Us
      • Our team
      • Certificate
      • Service
  • Contact Us
  • Send Inquiry

Related search

Search

Member Center
Exit
Data is empty
0
qr Code Url

Scan qrcode to view mobile website

HomeNewsIndustry news
The principle, advantages and disadvantages of the source of electron beam evaporation

The principle, advantages and disadvantages of the source of electron beam evaporation

author: ATS
2023-03-23

The principle, advantages and disadvantages of the source of electron beam evaporation

The source of resistance heating evaporation can not meet the needs of evaporation of some high melting point metals and oxides, especially for the preparation of high-purity films. Electron beam heating evaporation method has overcome many shortcomings of resistance heating evaporation and has been widely used.

Electron beam heating principle:

The focused electron beam can locally heat the element source and avoid pollution because it does not heat other parts;

High energy electron beam can make high melting point elements reach enough high temperature to produce proper vapor pressure.

Advantages of electron beam evaporation source:

  1. The beam density of electron beam is high, which can obtain much higher energy density than resistance heating source.
  2. The evaporated material is placed in a water-cooled crucible, which avoids the evaporation of the container material and the reaction between the container material and the evaporated material, and improves the purity of the film.
  3. The heat is directly added to the surface of the material, which has high thermal efficiency and small heat conduction and radiation loss.

Disadvantages of electron beam evaporation source:

  1. It can ionize the evaporated gas and residual gas, and sometimes affect the quality of the film;
  2. The structure of electron beam evaporation device is complex and expensive;
  3. The soft X-ray produced has certain harm to human body.

More details, please follow us: http://www.jsats.en.alibaba.com www.atsdmcl.com

Related News

  • image Classification and Characteristics of Optical Thin Films
    2023-03-23 56
  • image Application of various coating technologies and methods
    2023-03-23 58
  • image Concept of film uniformity
    2023-03-23 39
  • image Introduction to thin film optics
    2023-03-23 37
  • image Introduction for Silicon Monoxide
    2023-03-16 35
  • image ZnS Sinter Spec Summary
    2023-03-16 38
  • image The Definition of Reflector
    2023-03-16 37
  • image Introduction for Ti3O5 Products
    2023-03-16 44

sales@dmcl.cn, alesha@dmcl.cn

+86-0523-8821 5885

+86-180 5265 6868   +86-180 5265 3532

No. 28, Zhennan Alley, Baimi Town, Jiangyan, Taizhou, Jiangsu, China

© 2020, Nomads Powered by Joinf
粤ICP备12019139号 粤公网安备44030502001115号
Sitemap

About ATS

  • Company Profile

  • Our Factory

  • Our Team

  • Culture Philosophy

  • Certificates

Service

  • Sales Service

  • Technical Support

  • Service Contact

News
  • Products

  • Company

  • Industry

Contact us

  • Contact Information

  • Inquiry/Feedback

Product Categories

  • Zinc Sulfide (ZnS)
  • Trititanium Pentoxide (Ti3O5)
  • Silicon Monoxide (SiO)

  • Evaporation Materials
  • Infrared Laser Materials
  • Other Optical Materials

(365062)